KIST develops nanometer-thick electromagentic shielding film using MXene

A Korean research team has developed a technology to fabricate an ultrathin material for electromagnetic interference(EMI) shielding. The research team, led by Koo Chong-Min, the head of the Materials Architecturing Research Center at the Korea Institute of Science and Technology(KIST), announced that it had developed an ultrathin nanometer-thick film, using MXene, a new two-dimensional nanomaterial for EMI shielding.